Sentaurus is a suite of TCAD tools which simulates the fabrication,operation and reliability of semiconductor devices. The Sentaurus simulators use physical models to represent the wafer fabrication steps and device operation, thereby allowing the exploration and optimization of new semiconductor devices. The Sentaurus TCAD tools work seamlessly and can be combined into complete simulation flows in 2-D and 3-D.Sentaurus TCAD supports silicon and compound semiconductor technologies, covering a broad range of semiconductor applications. Synopsys Sentaurus TCAD 2024.03 Linux Tested Picture Key Applications: CMOS, FinFET Memory (DRAM, NVM) Power Devices (Si, SiC, GaN) RF Devices (GaAs, InP, GaN) Optoelectronics (CIS, Solar Cells,Photodetectors) BEoL Reliability Value of Sentaurus TCAD in Technology Development and Optimization Semiconductor manufacturers face the challenge of developing process...
Synopsys 3DIC Compiler, a unified exploration-to-signoff platform, delivers the highest levels of design efficiency for capacity and performance. It leverages a common data-model to integrate design, die-to-die routing, native system analysis, verification, and signoff in a single environment. Synopsys 3DSO.ai, industry’s first autonomous AI optimization solution for 2.5D and 3D heterogeneous design and integration, seamlessly integrates with 3DIC Compiler to maximize system performance and quality of results at a rapid pace for thermal integrity, signal integrity, and power network design. Ensuring system technology co-optimization (STCO), Synopsys 3DIC Compiler is certified by all foundries and leveraged successfully by customers in dozens of designs. Key Benefits Unmatched Scalability System-of-chips integration over hundreds of billions of transistors High Productivity Fast exploration and design...
Custom WaveView™ ADV provides a complete transistorlevel analysis and debugging environment for pre-processing and post-processing SPICE and FastSPICE simulations. Custom WaveView ADV is integrated with Synopsys’ HSPICE®, FineSim® and CustomSim™ to streamline the debugging and analysis process for SPICE and FastSPICE simulation and increase design productivity. The combination of Custom WaveView ADV with Synopsys circuit simulators provides design teams with a high-performance,productive simulation debug and analysis environment for complex SoC design. Synopsys Custom WaveView ADV 2024.09 Win/Linux64 Tested Picture Custom WaveView ADV is a netlist-based debugging environment for SPICE and FastSPICE simulators such as HSPICE, FineSim and CustomSim. Custom WaveView ADV is also tightly integrated with Custom WaveView, enabling waveform cross-probing. Together, these tools aid designers in rapidly performing customized...
Virtual Test Drive (VTD) is our toolkit for the creation, configuration, presentation and evaluation of virtual environments in the scope of road and rail based simulations. It is used for the development of ADAS and automated driving systems as well as the core for training simulators. It covers the full range from the generation of 3d content to the simulation of complex traffic scenarios and, finally, to the simulation of either simplified or physically driven sensors. It is used in SiL, DiL, ViL and HiL applications and may also be operated as co-simulations including 3rd party or custom packages. By its open and modular design it can easily be interfaced and integrated. General: Build Systems and Compilers: We’ve upgraded our...
The Synopsys Custom Compiler™ design environment is a modern solution for full-custom analog, custom digital, and mixed-signal IC design. As the heart of the Synopsys Custom Design Family Custom Compiler provides design entry, simulation management and analysis, and custom layout editing features. It delivers industry-leading productivity, performance, and ease-of-use while remaining easy to adopt for users of legacy tools. Synopsys Custom Compiler 2023.12-SP1 Linux64 Tested Picture The Custom Compiler design environment includes features for mixed-signal design entry, design debug, simulation management, analysis, and reporting. For layout, Custom Compiler provides fast and user-friendly polygon editing features and boosts productivity with its pioneering visually-assisted automation flow. Visually assisted automation is an innovative approach that delivers 2-10X better layout productivity—especially for difficult FinFET-based...
Synopsys OptSim allows users to design and simulate current and next generation optical communication systems at the signal propagation level. Synopsys RSoft Photonic Device Tools 2024.09 Tested Picture These advanced tools enhance and accelerate user-modeling capabilities and provide real field design scenarios using extensive industry specifications. Our users include optical component and equipment manufacturers, system integrators, service providers, as well as government labs and academic institutions. Whether you are interested in maximizing performance, minimizing costs, reducing time to market, fast prototyping, or analyzing multiple “what-if” scenarios for optical communication systems, these tools will become an inseparable partner and the secret of your success. Optical Communication Synopsys OptSim is an award-winning software tool for the design and simulation of optical communication...
The AnyBody Modeling System is a State-of-the-Art musculoskeletal modeling and simulation software for biomechanical analysis. The AnyBody Modeling System allows you to create full body detailed musculoskeletal models and simulate internal body loads as e.g., muscle activity, muscle forces and joint reaction forces. Features of the AnyBody Modeling System Includes the AnyBody Managed Model Repository Musculoskeletal analysis of daily activities Self-contained and robust system GUI for interactive use Inverse dynamics Inverse-Inverse dynamics Force-dependent kinematics Posture and motion prediction Supports physiological load cases for Finite Element Analysis Interface to motion capture systems (C3D and BVH) Interfaces to anthropometric databases Supports anthropometric model scaling Console for batch processing
QuantumATK atomic-scale modeling software enables large-scale and thus more realistic material simulations, integrating multiple simulation methods, ranging from ab initio DFT to semi-empirical and classical force fields analysis, into an easy-to-use platform. QuantumATK accelerates semiconductor and materials R&D, and reduces time and costs by enabling more efficient workflows in the screening process of new materials across a broad range of high-tech industries. Synopsys QuantumATK V-2024.09 are some highlights of the new features and improvements for the following atomic-scale modeling methods and applications in semiconductor industry and beyond. Many-Body Perturbation Theory GW Advancements 10x memory reduction and large speed-up due to the new parallelization strategy. Enabled very accurate G0W0 calculations of electronic structure properties at a moderate computational cost for molecules,...
Synopsys S-Metro provides a comprehensive and powerful toolbox for automated assessment of numerical and image-based metrology data for photomask qualification, modeling data preparation, and process characterization. Process engineers use it to measure the lithographic performance, for instance through process window analysis. Synopsys S-Metro 2024.06 Win/Linux64 Tested Picture Metrology images from any source, whether photomask or wafer, can be processed and analyzed in Synopsys S-Metro as well. Images are aligned to the corresponding layout and can be averaged to improve contrast; contours are extracted for use in model calibration and validation as well as for training machine learning modes. Synopsys S-Metro automatically processes SEM image and CD data in a consistent and transparent manner. The infrastructure is capable of handling tens...
S-Litho represents advanced lithography simulation for semiconductor device manufacturing process development and optimization. It covers a wide range of applications in proximity printing, optical, immersion, extreme ultraviolet (EUV), and electron beam (e-beam) lithography. Process-limiting effects within the imaging system of an exposure tool can be thoroughly analyzed, taking the impact of mask and substrate topography on photoresist patterning into account. Interfacing S-Litho with Synopsys TCAD tools allows a seamless modeling of complex integration techniques such as double-patterning. The link between S-Litho and Synopsys Proteus mask synthesis applications accelerates the generation and validation of optical proximity correction (OPC) models and improves process robustness. Synopsys S-Litho 2024.06 Win/Linux64 Tested Picture S-Litho provides a comprehensive set of features to predict the outcome of...
