Synopsys Proteus™ full-chip mask synthesis smart manufacturing solutions enabling technologies down to 3nm and below. With the Synopsys Proteus family you can achieve exceptional precision, efficiency and speed in proximity correction, model building for correction, and analyzing proximity effects on corrected and uncorrected IC layout patterns, revolutionizing your chip fabrication process. The Synopsys Proteus full-chip mask synthesis family are the products of choice for leading edge IDMs and foundries and have been production proven for two decades with support for the latest EUV lithography processes. Synopsys Proteus 2023.12 Linux64 Tested Picture Key Benefits Largest Lithography Entitlement Industries first and most deployed inverse lithography solution with native curvilinear design and mask support. Fast Turn Around Time AI driven solutions with advanced...
Proteus WorkBench (PWB) is a powerful cockpit tool for the development and optimization of Proteus-based mask synthesis solutions. It is based on a powerful hierarchical GDSII/OASIS layout visualization and editing engine, providing a comprehensive environment for lithography simulation, compact model building, optical proximity correction (OPC) recipe tuning, litho rule checks, and mask synthesis flow development. Synopsys Proteus WorkBench 2023.12 Linux64 Tested Picture PWB offers an easy to use platform with access to a wide-ranging set of tools, enabling fast calibration of accurate models, supporting the optimization of highly efficient Proteus recipes for deployment in OPC and verification. As state-of-the-art lithography exposure tools are operated at their physical resolution limit, new mask and process technologies are being deployed to further shrink...
Sentaurus is a suite of TCAD tools which simulates the fabrication,operation and reliability of semiconductor devices. The Sentaurus simulators use physical models to represent the wafer fabrication steps and device operation, thereby allowing the exploration and optimization of new semiconductor devices. The Sentaurus TCAD tools work seamlessly and can be combined into complete simulation flows in 2-D and 3-D.Sentaurus TCAD supports silicon and compound semiconductor technologies, covering a broad range of semiconductor applications. Synopsys Sentaurus TCAD 2024.03 Linux Tested Picture Key Applications: CMOS, FinFET Memory (DRAM, NVM) Power Devices (Si, SiC, GaN) RF Devices (GaAs, InP, GaN) Optoelectronics (CIS, Solar Cells,Photodetectors) BEoL Reliability Value of Sentaurus TCAD in Technology Development and Optimization Semiconductor manufacturers face the challenge of developing process...
Synopsys 3DIC Compiler, a unified exploration-to-signoff platform, delivers the highest levels of design efficiency for capacity and performance. It leverages a common data-model to integrate design, die-to-die routing, native system analysis, verification, and signoff in a single environment. Synopsys 3DSO.ai, industry’s first autonomous AI optimization solution for 2.5D and 3D heterogeneous design and integration, seamlessly integrates with 3DIC Compiler to maximize system performance and quality of results at a rapid pace for thermal integrity, signal integrity, and power network design. Ensuring system technology co-optimization (STCO), Synopsys 3DIC Compiler is certified by all foundries and leveraged successfully by customers in dozens of designs. Key Benefits Unmatched Scalability System-of-chips integration over hundreds of billions of transistors High Productivity Fast exploration and design...
The Synopsys Custom Compiler™ design environment is a modern solution for full-custom analog, custom digital, and mixed-signal IC design. As the heart of the Synopsys Custom Design Family Custom Compiler provides design entry, simulation management and analysis, and custom layout editing features. It delivers industry-leading productivity, performance, and ease-of-use while remaining easy to adopt for users of legacy tools. Synopsys Custom Compiler 2023.12-SP1 Linux64 Tested Picture The Custom Compiler design environment includes features for mixed-signal design entry, design debug, simulation management, analysis, and reporting. For layout, Custom Compiler provides fast and user-friendly polygon editing features and boosts productivity with its pioneering visually-assisted automation flow. Visually assisted automation is an innovative approach that delivers 2-10X better layout productivity—especially for difficult FinFET-based...
Synopsys S-Metro provides a comprehensive and powerful toolbox for automated assessment of numerical and image-based metrology data for photomask qualification, modeling data preparation, and process characterization. Process engineers use it to measure the lithographic performance, for instance through process window analysis. Synopsys S-Metro 2024.06 Win/Linux64 Tested Picture Metrology images from any source, whether photomask or wafer, can be processed and analyzed in Synopsys S-Metro as well. Images are aligned to the corresponding layout and can be averaged to improve contrast; contours are extracted for use in model calibration and validation as well as for training machine learning modes. Synopsys S-Metro automatically processes SEM image and CD data in a consistent and transparent manner. The infrastructure is capable of handling tens...
S-Litho represents advanced lithography simulation for semiconductor device manufacturing process development and optimization. It covers a wide range of applications in proximity printing, optical, immersion, extreme ultraviolet (EUV), and electron beam (e-beam) lithography. Process-limiting effects within the imaging system of an exposure tool can be thoroughly analyzed, taking the impact of mask and substrate topography on photoresist patterning into account. Interfacing S-Litho with Synopsys TCAD tools allows a seamless modeling of complex integration techniques such as double-patterning. The link between S-Litho and Synopsys Proteus mask synthesis applications accelerates the generation and validation of optical proximity correction (OPC) models and improves process robustness. Synopsys S-Litho 2024.06 Win/Linux64 Tested Picture S-Litho provides a comprehensive set of features to predict the outcome of...
The Tweaker solution is the first and only complete ECO Platform with flexible flow control and integrated GUI, which handles all challenging capacity and complexity issues within ECO framework in a single machine. Everything is incremental As an ECO tool, Tweaker optimizes a design incrementally and locally, with minimal impact to the existing performance. In all of the ECO fixing operations, Tweaker only focuses on only critical portions of a design, known as the “ECO Domain”. For this reason, Tweaker can handle large designs in a very short turn-around time. Tweaker ECO covers all sign-off scenarios Timing/power optimization tools require MMMC (Multi-Mode, Multi-Corner) support as a basic ECO feature. Tweaker’s ECO-specific architecture takes the MMMC feature further by focusing only on the “ECO...
Sentaurus Process Explorer is a fast 3D process emulator used to identify and correct process integration issues during technology development. Synopsys Sentaurus Process Explorer 2024.03 Linux64 Tested Picture Sentaurus Process Explorer produces highly realistic 3D representations of process structures using GDSII mask data and a process recipe as input. Sentaurus Process Explorer is linked to the Synopsys TCAD simulators, such as Raphael FX, to enable the high accuracy RC extraction in Design Technology Co-Optimization (DTCO) applications.
Synopsys RTL Architect product represents the industry’s first physically-aware RTL analysis, exploration, and optimization system with signoff technology integration. Synopsys RTL Architect uses a fast, multi-dimensional implementation prediction engine that enables RTL designers to predict the power, performance, area, and congestion impact of their RTL changes. Built on a unified data model, Synopsys RTL Architect directly leverages Synopsys world-class implementation and golden signoff solutions, including Synopsys PrimePower RTL, to deliver results that are accurate early in the design cycle. Synopsys RTL Architect enables designers to significantly reduce RTL development time and to achieve “Simply Better RTL.” Key Benefits Increase Productivity Reduce project schedule with faster runtimes and fewer frontend – backend iterations Predict PPA Fast, implementation prediction engine ensures the...
