Synopsys S-Metro provides a comprehensive and powerful toolbox for automated assessment of numerical and image-based metrology data for photomask qualification, modeling data preparation, and process characterization. Process engineers use it to measure the lithographic performance, for instance through process window analysis.
Synopsys S-Metro 2024.06 Win/Linux64 Tested Picture
Metrology images from any source, whether photomask or wafer, can be processed and analyzed in Synopsys S-Metro as well. Images are aligned to the corresponding layout and can be averaged to improve contrast; contours are extracted for use in model calibration and validation as well as for training machine learning modes.
Synopsys S-Metro automatically processes SEM image and CD data in a consistent and transparent manner. The infrastructure is capable of handling tens of thousands of data points and scales well on compute clusters.
