Synopsys Proteus™ full-chip mask synthesis smart manufacturing solutions enabling technologies down to 3nm and below. With the Synopsys Proteus family you can achieve exceptional precision, efficiency and speed in proximity correction, model building for correction, and analyzing proximity effects on corrected and uncorrected IC layout patterns, revolutionizing your chip fabrication process. The Synopsys Proteus full-chip mask synthesis family are the products of choice for leading edge IDMs and foundries and have been production proven for two decades with support for the latest EUV lithography processes.
Synopsys Proteus 2023.12 Linux64 Tested Picture
Key Benefits
Largest Lithography Entitlement
Industries first and most deployed inverse lithography solution with native curvilinear design and mask support.
Fast Turn Around Time
AI driven solutions with advanced computation support for latest CPU and GPU technologies to reduce time to market.
Highly Predictive Models
Advanced compact 3D resist and mask models and industries only mask synthesis tools with rigorous physics-based model support through S-Litho.
More information:https://www.synopsys.com/content/dam/synopsys/silicon/datasheets/proteus-ds.pdf
