RSoft Photonic Device Tools, version 2024.09, introduces a suite of powerful new features and improvements designed to enhance the efficiency and capabilities of photonic device simulations. Key updates include GPU acceleration for FullWAVE FDTD, enhancements to BeamPROP BPM, MetaOptic Designer, and DiffractMOD RCWA, and changes to the Python interface. These advancements promise significant speed improvements, better stability, and increased usability for photonic device designers. Synopsys RSoft Photonic Device Tools 2024.09 Tested Picture The RSoft Photonic Device Tools 2024.09 release includes many new features to improve usability and speed for improved photonic device/grating simulation: Support for GPU-based FDTD simulation in FullWAVE FDTD Supports NVIDIA GPU hardware Significant speedup, exact speedup is hardware/problem dependent Non-orthogonal unit cells in DiffractMOD RCWA More efficient...
ALINT-PRO is a design verification solution for RTL code written in VHDL, Verilog, and SystemVerilog, which is focused on verifying coding style and naming conventions, RTL and post-synthesis simulation mismatches, smooth and optimal synthesis, correct FSM descriptions, avoiding problems on further design stages, clocks and reset tree issues, CDC, RDC, DFT, and coding for portability and reuse. The solution performs static analysis based on RTL and SDC™ source files uncovering critical design issues early in the design cycle, which in turn reduces design signoff time dramatically. Running ALINT-PRO before the RTL simulation and logic synthesis phases prevents design issues spreading into the downstream stages of design flow and reduces the number of iterations required to finish the design. Available versions:...
MVTec HALCON 24.11, we are focusing on even better AI, specifically deep learning algorithms. Among other features, users can now detect and evaluate unexpected behavior in deep-learning-based classification. Out of Distribution Detection (OOD) for Classification This new HALCON feature makes it easy to recognize unexpected behavior caused by incorrect classifications in production. Thus, users can take appropriate measures, such as stopping the machine, in a targeted and efficient manner. When using a deep learning classifier, unknown objects are assigned to one of the classes that the system has learned. This can lead to problems if, for example, the defects or objects themselves are of a type that has never occurred before. The new deep learning feature “Out of Distribution Detection...
MIKE Powered by DHI the part of DHI, the global organisation dedicated to solving challenges in water environments worldwide, has released update of DHI MIKE Zero 2025, is the ideal and preferred software package for your business within water environments. Available versions: 2025.x , 2024.x , 2023.x , 2022.x , … The MIKE product family is the only product suite that covers all aspects of water and environment, from source to tap and from mountain top to the ocean. Through close links to DHI’s research and consulting activities, MIKE products are always leading the way by using the latest science, and at the same time are flexible and efficient engineering tools. Water modelling and GIS for cities MIKE URBAN is...
AVEVA Process Simulation brings agility to the entire process life cycle—design, simulation, training, and operations. Build an integrated digital twin for your entire plant life cycle and use the same process model throughout every engineering phase. Engineers can collaborate across disciplines in a single integrated platform to explore all dimensions of a potential design. For each engineering process, they’ll be able to quantify the impact on sustainability, feasibility, and profitability. Embrace digital transformation to reinvent process simulation Design a sustainable world Use custom modeling and built-in sustainability features to decarbonize your process plants and achieve net zero Streamline your workflows A single, easy-to-use interface replaces dozens of specialized programs throughout your plants’ life cycle Embrace digital transformation Access real-time data from...
Proteus ProGen models are empirical compact models reflecting the performance of a lithography process. Model parameters are determined by fitting experimental data. The Proteus Modeling Platform (PMP) provides a single environment for calibrating those parameters with a high degree of automation and tuning them for optimum performance in downstream applications. Synopsys ProGen 2023.12 Linux64 Tested Picture ProGen, Proteus’ highly customizable solution calibrates a single model that is utilized by both the space- and frequency-domain engines.
Synopsys Proteus™ full-chip mask synthesis smart manufacturing solutions enabling technologies down to 3nm and below. With the Synopsys Proteus family you can achieve exceptional precision, efficiency and speed in proximity correction, model building for correction, and analyzing proximity effects on corrected and uncorrected IC layout patterns, revolutionizing your chip fabrication process. The Synopsys Proteus full-chip mask synthesis family are the products of choice for leading edge IDMs and foundries and have been production proven for two decades with support for the latest EUV lithography processes. Synopsys Proteus 2023.12 Linux64 Tested Picture Key Benefits Largest Lithography Entitlement Industries first and most deployed inverse lithography solution with native curvilinear design and mask support. Fast Turn Around Time AI driven solutions with advanced...
Proteus WorkBench (PWB) is a powerful cockpit tool for the development and optimization of Proteus-based mask synthesis solutions. It is based on a powerful hierarchical GDSII/OASIS layout visualization and editing engine, providing a comprehensive environment for lithography simulation, compact model building, optical proximity correction (OPC) recipe tuning, litho rule checks, and mask synthesis flow development. Synopsys Proteus WorkBench 2023.12 Linux64 Tested Picture PWB offers an easy to use platform with access to a wide-ranging set of tools, enabling fast calibration of accurate models, supporting the optimization of highly efficient Proteus recipes for deployment in OPC and verification. As state-of-the-art lithography exposure tools are operated at their physical resolution limit, new mask and process technologies are being deployed to further shrink...
Synopsys OptSim allows users to design and simulate current and next generation optical communication systems at the signal propagation level. Synopsys RSoft Photonic Device Tools 2024.09 Tested Picture These advanced tools enhance and accelerate user-modeling capabilities and provide real field design scenarios using extensive industry specifications. Our users include optical component and equipment manufacturers, system integrators, service providers, as well as government labs and academic institutions. Whether you are interested in maximizing performance, minimizing costs, reducing time to market, fast prototyping, or analyzing multiple “what-if” scenarios for optical communication systems, these tools will become an inseparable partner and the secret of your success. Optical Communication Synopsys OptSim is an award-winning software tool for the design and simulation of optical communication...
QuantumATK atomic-scale modeling software enables large-scale and thus more realistic material simulations, integrating multiple simulation methods, ranging from ab initio DFT to semi-empirical and classical force fields analysis, into an easy-to-use platform. QuantumATK accelerates semiconductor and materials R&D, and reduces time and costs by enabling more efficient workflows in the screening process of new materials across a broad range of high-tech industries. Synopsys QuantumATK V-2024.09 are some highlights of the new features and improvements for the following atomic-scale modeling methods and applications in semiconductor industry and beyond. Many-Body Perturbation Theory GW Advancements 10x memory reduction and large speed-up due to the new parallelization strategy. Enabled very accurate G0W0 calculations of electronic structure properties at a moderate computational cost for molecules,...
