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Tag:2023

MVTec HALCON 2024 v24.11

MVTec HALCON 24.11, we are focusing on even better AI, specifically deep learning algorithms. Among other features, users can now detect and evaluate unexpected behavior in deep-learning-based classification. Out of Distribution Detection (OOD) for Classification This new HALCON feature makes it easy to recognize unexpected behavior caused by incorrect classifications in production. Thus, users can take appropriate measures, such as stopping the machine, in a targeted and efficient manner. When using a deep learning classifier, unknown objects are assigned to one of the classes that the system has learned. This can lead to problems if, for example, the defects or objects themselves are of a type that has never occurred before. The new deep learning feature “Out of Distribution Detection...

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DHI WEST 2025

WEST software is a sophisticated simulation tool used by operators and engineers to optimise plant design, operations and automation by targeting effluent quality, energy and cost. Make WEST your modelling platform of choice Plant Operators Investigate the complex process dynamics and interactions that characterise a modern WWTP. Evaluate treatment performance resulting from changes in the sewage composition and in operational strategy, using highly customisable dashboards. Wastewater Engineers & Consultants Support the design of new facilities and upgrades of existing ones. Identify actions to optimise and improve operational efficiency. Researchers Evaluate alternatives within a reasonable time frame. Develop and implement custom process models , automate objective evaluation and advanced statistical analysis.

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DHI MIKE+ 2025

MIKE+ offers a full suite of integrated software solutions for water systems with a flexible and scalable model manager layer at its core. The MIKE+ platform allows you to plug and play with different modules to customise water management solutions. They’re powerful alone – but even better when used together. Plus, some modules are transversal, so you can use them across your collection systems, rivers and flooding challenges. That’s the power of an integrated water modelling platform. MIKE+ Rainfall Runoff Prepare multiple rainfall-runoff models in one simulation. Choose between the Time-Area method, Kinematic Wave routing method, LIDS options, linear reservoir models, Storm Water Quality Method or UHM. You can even combine these models with rainfall-dependent inflow and infiltration (RDI). MIKE+...

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DHI MIKE ZERO 2025

MIKE Powered by DHI the part of DHI, the global organisation dedicated to solving challenges in water environments worldwide, has released update of DHI MIKE Zero 2025, is the ideal and preferred software package for your business within water environments. The MIKE product family is the only product suite that covers all aspects of water and environment, from source to tap and from mountain top to the ocean. Through close links to DHI’s research and consulting activities, MIKE products are always leading the way by using the latest science, and at the same time are flexible and efficient engineering tools. Water modelling and GIS for cities MIKE URBAN is the only modelling software that covers all aspects of water, wastewater...

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Leica CloudWorx 2024.1.1 For AutoCAD 2022-2025

Leica CloudWorx for AutoCAD is the most efficient and popular plug-in software for using as-built point cloud data – captured by laser scanners – directly within AutoCAD. hr /> Requirement:Autodesk AutoCAD 2022-2025 Leica CloudWorx 2024.1.1 For AutoCAD 2022-2025 Tested Picture Users take advantage of the familiar AutoCAD interface and tools to shorten the learning curve for working with laser scan data. Users can create accurate 2D and 3D as-builts, check proposed designs against existing conditions, perform critical construction & fabrication QA, and more… all directly within AutoCAD. In the past, users often struggled with point cloud manipulation when using AutoCAD point cloud plug-ins. CloudWorx overcomes this with its powerful TruSpace viewing window. This intuitive, panoramic viewing window lets users “see”...

AVEVA Process Simulation 2024.2

AVEVA Process Simulation brings agility to the entire process life cycle—design, simulation, training, and operations. Build an integrated digital twin for your entire plant life cycle and use the same process model throughout every engineering phase. Engineers can collaborate across disciplines in a single integrated platform to explore all dimensions of a potential design. For each engineering process, they’ll be able to quantify the impact on sustainability, feasibility, and profitability. Embrace digital transformation to reinvent process simulation Design a sustainable world Use custom modeling and built-in sustainability features to decarbonize your process plants and achieve net zero Streamline your workflows A single, easy-to-use interface replaces dozens of specialized programs throughout your plants’ life cycle Embrace digital transformation Access real-time data from...

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Datamine Discover 2024 Build 23.0.268

The Datamine Discover 2024 v23.0.268 release is now available. Discover 2024 Discover 3D 2024 (optional license – if not licensed is available in viewer mode functionality) MapInfo Pro 2023 build 142 MapInfo Pro Advanced (Raster menu) MapInfo Pro Premium services Bing (annual subscription license, expires 31st December 2024) Datamine Discover 2023 Tested Picture Some of the new features of Discover 2024 are – Discover New feature to convert mobile project raster data to ECW format Raster data is preprocessed during mobile project creation to speed up check out process New mobile basemap project type Significant bug fixes and enhancements with many feature updates Discover 3D Significant performance optimisation for voxel model rendering and data modification Numerous voxel tool enhancements Ability to batch...

Synopsys ProGen 2023.12 Linux64

Proteus ProGen models are empirical compact models reflecting the performance of a lithography process. Model parameters are determined by fitting experimental data. The Proteus Modeling Platform (PMP) provides a single environment for calibrating those parameters with a high degree of automation and tuning them for optimum performance in downstream applications. Synopsys ProGen 2023.12 Linux64 Tested Picture ProGen, Proteus’ highly customizable solution calibrates a single model that is utilized by both the space- and frequency-domain engines.

Synopsys Proteus 2023.12 Linux64

Synopsys Proteus™ full-chip mask synthesis smart manufacturing solutions enabling technologies down to 3nm and below. With the Synopsys Proteus family you can achieve exceptional precision, efficiency and speed in proximity correction, model building for correction, and analyzing proximity effects on corrected and uncorrected IC layout patterns, revolutionizing your chip fabrication process. The Synopsys Proteus full-chip mask synthesis family are the products of choice for leading edge IDMs and foundries and have been production proven for two decades with support for the latest EUV lithography processes. Synopsys Proteus 2023.12 Linux64 Tested Picture Key Benefits Largest Lithography Entitlement Industries first and most deployed inverse lithography solution with native curvilinear design and mask support. Fast Turn Around Time AI driven solutions with advanced...

Synopsys Proteus WorkBench 2023.12 Linux64

Proteus WorkBench (PWB) is a powerful cockpit tool for the development and optimization of Proteus-based mask synthesis solutions. It is based on a powerful hierarchical GDSII/OASIS layout visualization and editing engine, providing a comprehensive environment for lithography simulation, compact model building, optical proximity correction (OPC) recipe tuning, litho rule checks, and mask synthesis flow development. Synopsys Proteus WorkBench 2023.12 Linux64 Tested Picture PWB offers an easy to use platform with access to a wide-ranging set of tools, enabling fast calibration of accurate models, supporting the optimization of highly efficient Proteus recipes for deployment in OPC and verification. As state-of-the-art lithography exposure tools are operated at their physical resolution limit, new mask and process technologies are being deployed to further shrink...

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