ShipConstructor allows the best shipbuilders to see ROI on every project, or even on the current block about to be cut, no matter what. Available versions: 2026.x , 2023.x ,… SSI ShipConstructor 2026R3 Tested Picture Seeing a quick ROI also means getting up and running quickly, without lengthy training times or delays caused by unfamiliar or unoptimized tools. Getting up to speed quickly plays an especially crucial role when it’s time for your organization to adjust to market demand. Being able to trust that no matter what level of experience your workforce has or where they’re located, your ability to accept a new project with confidence will not be jeopardized. The reality of global shipbuilding means that professionals who work on design, engineering, and construction can...
Altair Pulse is a low-code environment to construct and orchestrate engineering workflows involving many software tools from different sources. From the broad workflows required to simulate complex systems of systems to the detailed processes needed to enable fast, reliable, repeatable modeling, analysis, and optimization, Pulse ensures your team has always the right model, for the right decision, at the right time. Orchestrate Meaningful Models A meaningful simulation model comprises the correct level of complexity and data needed at a particular stage of a project. Whether at the concept design stage or deep into product engineering, Altair understands the requirements for meaningful models that cross disciplines to boost decision-making confidence with fast design exploration, trade-off evaluations, and ‘what if’ studies. By...
Altair Virtual Wind Tunnel UltraFluidX is a solution designed to provide better wind tunnel simulation and user experience. Altair’s HyperWorks VWT is able to more accurately and quickly predict an automobile’s aerodynamic performance. From 2024 version Virtual Wind Tunnel will works with Hypermesh CFD together.
ALINT-PRO is a design verification solution for RTL code written in VHDL, Verilog, and SystemVerilog, which is focused on verifying coding style and naming conventions, RTL and post-synthesis simulation mismatches, smooth and optimal synthesis, correct FSM descriptions, avoiding problems on further design stages, clocks and reset tree issues, CDC, RDC, DFT, and coding for portability and reuse. The solution performs static analysis based on RTL and SDC™ source files uncovering critical design issues early in the design cycle, which in turn reduces design signoff time dramatically. Running ALINT-PRO before the RTL simulation and logic synthesis phases prevents design issues spreading into the downstream stages of design flow and reduces the number of iterations required to finish the design. Available versions:...
MVTec HALCON 24.11, we are focusing on even better AI, specifically deep learning algorithms. Among other features, users can now detect and evaluate unexpected behavior in deep-learning-based classification. Out of Distribution Detection (OOD) for Classification This new HALCON feature makes it easy to recognize unexpected behavior caused by incorrect classifications in production. Thus, users can take appropriate measures, such as stopping the machine, in a targeted and efficient manner. When using a deep learning classifier, unknown objects are assigned to one of the classes that the system has learned. This can lead to problems if, for example, the defects or objects themselves are of a type that has never occurred before. The new deep learning feature “Out of Distribution Detection...
AVEVA Process Simulation brings agility to the entire process life cycle—design, simulation, training, and operations. Build an integrated digital twin for your entire plant life cycle and use the same process model throughout every engineering phase. Engineers can collaborate across disciplines in a single integrated platform to explore all dimensions of a potential design. For each engineering process, they’ll be able to quantify the impact on sustainability, feasibility, and profitability. Embrace digital transformation to reinvent process simulation Design a sustainable world Use custom modeling and built-in sustainability features to decarbonize your process plants and achieve net zero Streamline your workflows A single, easy-to-use interface replaces dozens of specialized programs throughout your plants’ life cycle Embrace digital transformation Access real-time data from...
Proteus ProGen models are empirical compact models reflecting the performance of a lithography process. Model parameters are determined by fitting experimental data. The Proteus Modeling Platform (PMP) provides a single environment for calibrating those parameters with a high degree of automation and tuning them for optimum performance in downstream applications. Synopsys ProGen 2023.12 Linux64 Tested Picture ProGen, Proteus’ highly customizable solution calibrates a single model that is utilized by both the space- and frequency-domain engines.
Synopsys Proteus™ full-chip mask synthesis smart manufacturing solutions enabling technologies down to 3nm and below. With the Synopsys Proteus family you can achieve exceptional precision, efficiency and speed in proximity correction, model building for correction, and analyzing proximity effects on corrected and uncorrected IC layout patterns, revolutionizing your chip fabrication process. The Synopsys Proteus full-chip mask synthesis family are the products of choice for leading edge IDMs and foundries and have been production proven for two decades with support for the latest EUV lithography processes. Synopsys Proteus 2023.12 Linux64 Tested Picture Key Benefits Largest Lithography Entitlement Industries first and most deployed inverse lithography solution with native curvilinear design and mask support. Fast Turn Around Time AI driven solutions with advanced...
Proteus WorkBench (PWB) is a powerful cockpit tool for the development and optimization of Proteus-based mask synthesis solutions. It is based on a powerful hierarchical GDSII/OASIS layout visualization and editing engine, providing a comprehensive environment for lithography simulation, compact model building, optical proximity correction (OPC) recipe tuning, litho rule checks, and mask synthesis flow development. Synopsys Proteus WorkBench 2023.12 Linux64 Tested Picture PWB offers an easy to use platform with access to a wide-ranging set of tools, enabling fast calibration of accurate models, supporting the optimization of highly efficient Proteus recipes for deployment in OPC and verification. As state-of-the-art lithography exposure tools are operated at their physical resolution limit, new mask and process technologies are being deployed to further shrink...
The Tweaker solution is the first and only complete ECO Platform with flexible flow control and integrated GUI, which handles all challenging capacity and complexity issues within ECO framework in a single machine. Everything is incremental As an ECO tool, Tweaker optimizes a design incrementally and locally, with minimal impact to the existing performance. In all of the ECO fixing operations, Tweaker only focuses on only critical portions of a design, known as the “ECO Domain”. For this reason, Tweaker can handle large designs in a very short turn-around time. Tweaker ECO covers all sign-off scenarios Timing/power optimization tools require MMMC (Multi-Mode, Multi-Corner) support as a basic ECO feature. Tweaker’s ECO-specific architecture takes the MMMC feature further by focusing only on the “ECO...
