Cadence Common Patcher with License Generater Tool for 2024-2025 Cadence Assura Physical Verification: Update_ASSURA04.16.001-618 (2.95GB) Cadence AWR Design Environment v24.1:Base_AWR24.10.000 (1.41GB) Cadence Digital Design Implementation (DDI) System 24.10.000(46.53GB) Cadence EMX Planar 3D Solver 2024.1 Linux64 Cadence Integrated Circuit (Advanced Node Virtuoso): ICADVM 20.10.280(11.53GB) Cadence Extraction Tools (Quantus QRC): Base_QUANTUS24.11.000 (3.25GB) Cadence Encounter Conformal: Base_CONFRML22.10.100 (2.84GB) Cadence Genus Synthesis Solution: Base_GENUS23.10.300 (1.52GB) Cadence Helium Virtual and Hybrid Studio:Base_HELIUM22.04.000 (4.08GB) Cadence Indago Debug Platform: Base_INDAGO22.03.00 (2.17GB) Cadence Incisive vManager: Base_VMANAGER23.09.002 (1.87GB) Cadence Innovus Implementation System: Base_INNOVUS21.10.000 (11.16GB) Cadence Integrated Circuit (Virtuoso): Hotfix_IC06.18.250 (15.50GB) Cadence IXCOM:Base_IXCOM22.04.000 (1.51GB) Cadence JasperGold Apps: Base_JASPER24.03.000 (1.15GB) Cadence JED AI 23.10.000 (5.98GB) Cadence Joules RTL Power Analysis: Base_JLS21.10.000 (2.11GB) Cadence Manufacturability and Variability Sign-Off: MVS15.20.000 Cadence Metric-Driven Verification:...
ALINT-PRO is a design verification solution for RTL code written in VHDL, Verilog, and SystemVerilog, which is focused on verifying coding style and naming conventions, RTL and post-synthesis simulation mismatches, smooth and optimal synthesis, correct FSM descriptions, avoiding problems on further design stages, clocks and reset tree issues, CDC, RDC, DFT, and coding for portability and reuse. The solution performs static analysis based on RTL and SDC™ source files uncovering critical design issues early in the design cycle, which in turn reduces design signoff time dramatically. Running ALINT-PRO before the RTL simulation and logic synthesis phases prevents design issues spreading into the downstream stages of design flow and reduces the number of iterations required to finish the design. Single Framework...
Altair Access 2024.1/2025.1 (Server License) Win/Linux Altair AI Studio(RapidMiner) 2024.1/2025.1 Win/Linux Altair Analytics Workbench 2023.5 (Server License) Win/Linux Altair Twin Activate 2024.1/2025.0 (Server License) Win/Linux64 Altair Compose 2024.1/2025.0 (Server License) Win/Linux64 Altair EDEM 2024.1/2025.0 (Server License) Win/Linux64 Altair FEKO 2024.1/2025.0 (Server License) Win/Linux64 Altair Flux 2024.1/2025.0 (Server License) Win/Linux64 Altair Grid Engine 2023.1.1 Linux Altair HyperMesh(HyperWorks) 2024.1/2025.0 (Server License) Win/Linux64 Altair HyperMesh CFD (HyperWorks CFD Solver) 2024.1/2025.0 (Server License) Win/Linux64 Altair HyperSpice 2024.0/2025.0 (Server License) Win/Linux64 Altair InsightPro 2025.1 (Server License) Linux64 Altair InsightPro for License Analytics 2025.1 (Server License) Linux64 Altair Knowledge Studio 2023.3 Altair Mechanical Solvers 2024.1/2025.0 (Server License) Win/Linux64 Altair Solvers 2024.1/2025.0 (Server License) Win/Linux64 Altair Virtual Wind Tunnel UltraFluidx 2024.1/2025.0 (Server License) Win/Linux64 Altair SimLab 2024.1/2025.0...
MVTec HALCON 24.11, we are focusing on even better AI, specifically deep learning algorithms. Among other features, users can now detect and evaluate unexpected behavior in deep-learning-based classification. Out of Distribution Detection (OOD) for Classification This new HALCON feature makes it easy to recognize unexpected behavior caused by incorrect classifications in production. Thus, users can take appropriate measures, such as stopping the machine, in a targeted and efficient manner. When using a deep learning classifier, unknown objects are assigned to one of the classes that the system has learned. This can lead to problems if, for example, the defects or objects themselves are of a type that has never occurred before. The new deep learning feature “Out of Distribution Detection...
MIKE Powered by DHI the part of DHI, the global organisation dedicated to solving challenges in water environments worldwide, has released update of DHI MIKE Zero 2025, is the ideal and preferred software package for your business within water environments. The MIKE product family is the only product suite that covers all aspects of water and environment, from source to tap and from mountain top to the ocean. Through close links to DHI’s research and consulting activities, MIKE products are always leading the way by using the latest science, and at the same time are flexible and efficient engineering tools. Water modelling and GIS for cities MIKE URBAN is the only modelling software that covers all aspects of water, wastewater...
AVEVA Process Simulation brings agility to the entire process life cycle—design, simulation, training, and operations. Build an integrated digital twin for your entire plant life cycle and use the same process model throughout every engineering phase. Engineers can collaborate across disciplines in a single integrated platform to explore all dimensions of a potential design. For each engineering process, they’ll be able to quantify the impact on sustainability, feasibility, and profitability. Embrace digital transformation to reinvent process simulation Design a sustainable world Use custom modeling and built-in sustainability features to decarbonize your process plants and achieve net zero Streamline your workflows A single, easy-to-use interface replaces dozens of specialized programs throughout your plants’ life cycle Embrace digital transformation Access real-time data from...
The Datamine Discover 2024 v23.0.268 release is now available. Discover 2024 Discover 3D 2024 (optional license – if not licensed is available in viewer mode functionality) MapInfo Pro 2023 build 142 MapInfo Pro Advanced (Raster menu) MapInfo Pro Premium services Bing (annual subscription license, expires 31st December 2024) Datamine Discover 2023 Tested Picture Some of the new features of Discover 2024 are – Discover New feature to convert mobile project raster data to ECW format Raster data is preprocessed during mobile project creation to speed up check out process New mobile basemap project type Significant bug fixes and enhancements with many feature updates Discover 3D Significant performance optimisation for voxel model rendering and data modification Numerous voxel tool enhancements Ability to batch...
Proteus ProGen models are empirical compact models reflecting the performance of a lithography process. Model parameters are determined by fitting experimental data. The Proteus Modeling Platform (PMP) provides a single environment for calibrating those parameters with a high degree of automation and tuning them for optimum performance in downstream applications. Synopsys ProGen 2023.12 Linux64 Tested Picture ProGen, Proteus’ highly customizable solution calibrates a single model that is utilized by both the space- and frequency-domain engines.
Synopsys Proteus™ full-chip mask synthesis smart manufacturing solutions enabling technologies down to 3nm and below. With the Synopsys Proteus family you can achieve exceptional precision, efficiency and speed in proximity correction, model building for correction, and analyzing proximity effects on corrected and uncorrected IC layout patterns, revolutionizing your chip fabrication process. The Synopsys Proteus full-chip mask synthesis family are the products of choice for leading edge IDMs and foundries and have been production proven for two decades with support for the latest EUV lithography processes. Synopsys Proteus 2023.12 Linux64 Tested Picture Key Benefits Largest Lithography Entitlement Industries first and most deployed inverse lithography solution with native curvilinear design and mask support. Fast Turn Around Time AI driven solutions with advanced...
Proteus WorkBench (PWB) is a powerful cockpit tool for the development and optimization of Proteus-based mask synthesis solutions. It is based on a powerful hierarchical GDSII/OASIS layout visualization and editing engine, providing a comprehensive environment for lithography simulation, compact model building, optical proximity correction (OPC) recipe tuning, litho rule checks, and mask synthesis flow development. Synopsys Proteus WorkBench 2023.12 Linux64 Tested Picture PWB offers an easy to use platform with access to a wide-ranging set of tools, enabling fast calibration of accurate models, supporting the optimization of highly efficient Proteus recipes for deployment in OPC and verification. As state-of-the-art lithography exposure tools are operated at their physical resolution limit, new mask and process technologies are being deployed to further shrink...
