The nextnano++ package provides you with tools for designing, optimizing, and analyzing optoelectronic nanodevices of arbitrary geometries in 1D, 2D and 3D. This package is the best choice for modelling properties of a vast number of semiconductor structures. It allows you to design optoelectronic devices made of quantum wells, wires, and dots. Available versions: 2025.x ,2024.x ,2023.x ,… NextNano++ Package 2024.12 Tested Picture With the nextnano++ package, you gain access to advanced computational capabilities, which includes calculation of band structures, densities of states, charge distributions, wave functions, strain, piezo effects, optical spectra, quantized conductance, and much more. This package includes: nextnano++ nextnano3 nextnano.MSB nextnanomat nextnanopy With a comprehensive suite of advanced features including a user-friendly graphical workflow manager, seamless integration...
QuantumATK atomic-scale modeling software enables large-scale and thus more realistic material simulations, integrating multiple simulation methods, ranging from ab initio DFT to semi-empirical and classical force fields analysis, into an easy-to-use platform. QuantumATK accelerates semiconductor and materials R&D, and reduces time and costs by enabling more efficient workflows in the screening process of new materials across a broad range of high-tech industries. Available versions: 2025.x ,2024.x ,2023.x ,… Synopsys QuantumATK 2025.06 Tested Picture QuantumATK X-2025.06 are some highlights of the new features and improvements in this version across different atomic-scale modeling methods and applications for the semiconductor industry and beyond. GPU Acceleration of DFT and Semi-Empirical On average 10x+ speed-up of the most time-consuming parts of bulk and NEGF device...
ALINT-PRO is a design verification solution for RTL code written in VHDL, Verilog, and SystemVerilog, which is focused on verifying coding style and naming conventions, RTL and post-synthesis simulation mismatches, smooth and optimal synthesis, correct FSM descriptions, avoiding problems on further design stages, clocks and reset tree issues, CDC, RDC, DFT, and coding for portability and reuse. The solution performs static analysis based on RTL and SDC™ source files uncovering critical design issues early in the design cycle, which in turn reduces design signoff time dramatically. Running ALINT-PRO before the RTL simulation and logic synthesis phases prevents design issues spreading into the downstream stages of design flow and reduces the number of iterations required to finish the design. Available versions:...
MVTec HALCON 24.11, we are focusing on even better AI, specifically deep learning algorithms. Among other features, users can now detect and evaluate unexpected behavior in deep-learning-based classification. Out of Distribution Detection (OOD) for Classification This new HALCON feature makes it easy to recognize unexpected behavior caused by incorrect classifications in production. Thus, users can take appropriate measures, such as stopping the machine, in a targeted and efficient manner. When using a deep learning classifier, unknown objects are assigned to one of the classes that the system has learned. This can lead to problems if, for example, the defects or objects themselves are of a type that has never occurred before. The new deep learning feature “Out of Distribution Detection...
MIKE Powered by DHI the part of DHI, the global organisation dedicated to solving challenges in water environments worldwide, has released update of DHI MIKE Zero 2025, is the ideal and preferred software package for your business within water environments. Available versions: 2025.x , 2024.x , 2023.x , 2022.x , … The MIKE product family is the only product suite that covers all aspects of water and environment, from source to tap and from mountain top to the ocean. Through close links to DHI’s research and consulting activities, MIKE products are always leading the way by using the latest science, and at the same time are flexible and efficient engineering tools. Water modelling and GIS for cities MIKE URBAN is...
AVEVA Process Simulation brings agility to the entire process life cycle—design, simulation, training, and operations. Build an integrated digital twin for your entire plant life cycle and use the same process model throughout every engineering phase. Engineers can collaborate across disciplines in a single integrated platform to explore all dimensions of a potential design. For each engineering process, they’ll be able to quantify the impact on sustainability, feasibility, and profitability. Embrace digital transformation to reinvent process simulation Design a sustainable world Use custom modeling and built-in sustainability features to decarbonize your process plants and achieve net zero Streamline your workflows A single, easy-to-use interface replaces dozens of specialized programs throughout your plants’ life cycle Embrace digital transformation Access real-time data from...
Proteus ProGen models are empirical compact models reflecting the performance of a lithography process. Model parameters are determined by fitting experimental data. The Proteus Modeling Platform (PMP) provides a single environment for calibrating those parameters with a high degree of automation and tuning them for optimum performance in downstream applications. Synopsys ProGen 2023.12 Linux64 Tested Picture ProGen, Proteus’ highly customizable solution calibrates a single model that is utilized by both the space- and frequency-domain engines.
Synopsys Proteus™ full-chip mask synthesis smart manufacturing solutions enabling technologies down to 3nm and below. With the Synopsys Proteus family you can achieve exceptional precision, efficiency and speed in proximity correction, model building for correction, and analyzing proximity effects on corrected and uncorrected IC layout patterns, revolutionizing your chip fabrication process. The Synopsys Proteus full-chip mask synthesis family are the products of choice for leading edge IDMs and foundries and have been production proven for two decades with support for the latest EUV lithography processes. Synopsys Proteus 2023.12 Linux64 Tested Picture Key Benefits Largest Lithography Entitlement Industries first and most deployed inverse lithography solution with native curvilinear design and mask support. Fast Turn Around Time AI driven solutions with advanced...
Proteus WorkBench (PWB) is a powerful cockpit tool for the development and optimization of Proteus-based mask synthesis solutions. It is based on a powerful hierarchical GDSII/OASIS layout visualization and editing engine, providing a comprehensive environment for lithography simulation, compact model building, optical proximity correction (OPC) recipe tuning, litho rule checks, and mask synthesis flow development. Synopsys Proteus WorkBench 2023.12 Linux64 Tested Picture PWB offers an easy to use platform with access to a wide-ranging set of tools, enabling fast calibration of accurate models, supporting the optimization of highly efficient Proteus recipes for deployment in OPC and verification. As state-of-the-art lithography exposure tools are operated at their physical resolution limit, new mask and process technologies are being deployed to further shrink...
The Tweaker solution is the first and only complete ECO Platform with flexible flow control and integrated GUI, which handles all challenging capacity and complexity issues within ECO framework in a single machine. Everything is incremental As an ECO tool, Tweaker optimizes a design incrementally and locally, with minimal impact to the existing performance. In all of the ECO fixing operations, Tweaker only focuses on only critical portions of a design, known as the “ECO Domain”. For this reason, Tweaker can handle large designs in a very short turn-around time. Tweaker ECO covers all sign-off scenarios Timing/power optimization tools require MMMC (Multi-Mode, Multi-Corner) support as a basic ECO feature. Tweaker’s ECO-specific architecture takes the MMMC feature further by focusing only on the “ECO...
