LucidShape is an intelligent 3D CAD system for optical engineers. Bring your exterior lighting products to market ahead of your competitors. The LucidShape 2024.09 release includes many new features to advance automotive lighting design: Creation of Micro Lens Masks: Micro-Lens-Arrays are used in projection systems for icon projection for both, interior and exterior automotive lighting applications. For an optical engineer, the illumination design task is to find a suitable mask geometry to achieve the desired illumination distribution. To alleviate this burden on the user, we have automated the mask computation process. New ways to generate small facets using the MacroFocal tools: Design trends are creating lenses with thousands and tens of thousands of facets. The MacroFocal tools have been expanded...
The AnyBody Modeling System is a State-of-the-Art musculoskeletal modeling and simulation software for biomechanical analysis. The AnyBody Modeling System allows you to create full body detailed musculoskeletal models and simulate internal body loads as e.g., muscle activity, muscle forces and joint reaction forces. Features of the AnyBody Modeling System Includes the AnyBody Managed Model Repository Musculoskeletal analysis of daily activities Self-contained and robust system GUI for interactive use Inverse dynamics Inverse-Inverse dynamics Force-dependent kinematics Posture and motion prediction Supports physiological load cases for Finite Element Analysis Interface to motion capture systems (C3D and BVH) Interfaces to anthropometric databases Supports anthropometric model scaling Console for batch processing
QuantumATK atomic-scale modeling software enables large-scale and thus more realistic material simulations, integrating multiple simulation methods, ranging from ab initio DFT to semi-empirical and classical force fields analysis, into an easy-to-use platform. QuantumATK accelerates semiconductor and materials R&D, and reduces time and costs by enabling more efficient workflows in the screening process of new materials across a broad range of high-tech industries. Synopsys QuantumATK V-2024.09 are some highlights of the new features and improvements for the following atomic-scale modeling methods and applications in semiconductor industry and beyond. Many-Body Perturbation Theory GW Advancements 10x memory reduction and large speed-up due to the new parallelization strategy. Enabled very accurate G0W0 calculations of electronic structure properties at a moderate computational cost for molecules,...
Synplify FPGA synthesis software is the industry standard for producing high-performance and cost-effective FPGA designs. Synplify software supports the latest VHDL and Verilog language constructs including SystemVerilog and VHDL-2008/2019. The software also supports FPGA architectures from a variety of FPGA vendors including Achronix, Intel, Lattice, Microsemi and AMD/Xilinx, all from a single RTL and constraint source. In addition, the Synplify synthesis tool provides high performance, faster runtime, area optimizations for cost and power reduction, incremental and team-design capabilities for faster FPGA design development. It includes features such as TMR and HAMMING-3 for FSM, that automates the creation of highly reliable designs such as those used in medical, automotive, industrial automation, communications, military, and aerospace applications. Synopsys Synplify FPGA 2024.09 Win/Linux64 Tested Picture...
Synopsys S-Metro provides a comprehensive and powerful toolbox for automated assessment of numerical and image-based metrology data for photomask qualification, modeling data preparation, and process characterization. Process engineers use it to measure the lithographic performance, for instance through process window analysis. Synopsys S-Metro 2024.06 Win/Linux64 Tested Picture Metrology images from any source, whether photomask or wafer, can be processed and analyzed in Synopsys S-Metro as well. Images are aligned to the corresponding layout and can be averaged to improve contrast; contours are extracted for use in model calibration and validation as well as for training machine learning modes. Synopsys S-Metro automatically processes SEM image and CD data in a consistent and transparent manner. The infrastructure is capable of handling tens...
S-Litho represents advanced lithography simulation for semiconductor device manufacturing process development and optimization. It covers a wide range of applications in proximity printing, optical, immersion, extreme ultraviolet (EUV), and electron beam (e-beam) lithography. Process-limiting effects within the imaging system of an exposure tool can be thoroughly analyzed, taking the impact of mask and substrate topography on photoresist patterning into account. Interfacing S-Litho with Synopsys TCAD tools allows a seamless modeling of complex integration techniques such as double-patterning. The link between S-Litho and Synopsys Proteus mask synthesis applications accelerates the generation and validation of optical proximity correction (OPC) models and improves process robustness. Synopsys S-Litho 2024.06 Win/Linux64 Tested Picture S-Litho provides a comprehensive set of features to predict the outcome of...
The Tweaker solution is the first and only complete ECO Platform with flexible flow control and integrated GUI, which handles all challenging capacity and complexity issues within ECO framework in a single machine. Everything is incremental As an ECO tool, Tweaker optimizes a design incrementally and locally, with minimal impact to the existing performance. In all of the ECO fixing operations, Tweaker only focuses on only critical portions of a design, known as the “ECO Domain”. For this reason, Tweaker can handle large designs in a very short turn-around time. Tweaker ECO covers all sign-off scenarios Timing/power optimization tools require MMMC (Multi-Mode, Multi-Corner) support as a basic ECO feature. Tweaker’s ECO-specific architecture takes the MMMC feature further by focusing only on the “ECO...
Sentaurus Process Explorer is a fast 3D process emulator used to identify and correct process integration issues during technology development. Synopsys Sentaurus Process Explorer 2024.03 Linux64 Tested Picture Sentaurus Process Explorer produces highly realistic 3D representations of process structures using GDSII mask data and a process recipe as input. Sentaurus Process Explorer is linked to the Synopsys TCAD simulators, such as Raphael FX, to enable the high accuracy RC extraction in Design Technology Co-Optimization (DTCO) applications.
The JewelSuiteTM Subsurface Modeling application constructs the industry’s most accurate 3D subsurface models, optimizing well placement, streamlining planning, and reducing investment risk. Baker Hughes JewelSuite Subsurface Modeling 2024.3 Tested Picture Highlights Optimal well placement By avoiding significant simplifications, our unique gridding methodology builds a realistic 3D picture of subsurface geology. Perform accurate, high-resolution gridding Optimize production and recovery with fewer wells Mitigate geological risk Faster, more collaborative planning Integrated into a single application, our guided workflows present the subsurface from any angle or assess any risk—at the click of a button. Utilize fast and efficient automated digital workflows Quickly integrate cross-discipline data and insights Transfer data without loss between workflows Reduced investment risk Our software simulates and compares complex combinations of...
CFD dispersion modelling, new ignition models and dynamic pressure in exceedance curves are just some of the new and improved features available in the newly released Phast and Safeti 9.0. DNV Phast&Safeti 2024 v9.0 Tesed Picture Key features of the release that improve safety and risk management include: CFD dispersion modelling in Phast Understanding the impact of flammable releases on the surroundings is important. We’ve introduced a CFD dispersion source scenario in Phast, powered by KFX™, our computational fluid dynamics tool for dispersion and fires. This enables more accurate atmospheric dispersion modelling for vapour, two-phase, and liquid flammable releases, which is essential for assessing the possible impact on people, buildings, or critical safety systems. It should be noted that the interaction of...
